|Title: ||Advances in the use of MOCVD methods for the production of novel photonic bandgap materials|
|Citation: ||Journal de physique IV, 2002, vol. 12, no. 4, pp. 63-68.|
|Publisher: ||EDP Sciences|
|Issue Date: ||2001 |
|Additional Links: ||http://www.edpsciences.org/10.1051/jp4:20020078|
|Abstract: ||We describe the use of novel MOCVD methods designed to infill templated structures based upon synthetic opals in order to provide increased refractive index contrast necessary for the creation of full photonic bandgap materials. The method employed is illustrated by considering the production of structures containing III-V material GaP and using this example, we demonstrate the ability to achieve levels of infill higher than any previously reported. We describe the use of novel MOCVD chemistry in the creation of a potentially new class of inorganic material, potentially capable of direct luminescence from within the photonic bandgap system.|
|Description: ||Full-text of this article is not available in this e-prints service. This article was originally published [following peer-review] in Journal de Physique IV, published by and copyright EDP Sciences.|
|Appears in Collections: ||Centre for Materials Science Research: Surface Coating and Characterisation Research Group |
|Files in This Item:|
There are no files associated with this item.
All Items in e-space are protected by copyright, with all rights reserved, unless otherwise indicated.