A comparison of titanium-based films produced by pulsed and continuous DC magnetron sputtering

2.50
Hdl Handle:
http://hdl.handle.net/2173/83495
Title:
A comparison of titanium-based films produced by pulsed and continuous DC magnetron sputtering
Authors:
Kelly, Peter; Beevers, C. F.; Henderson, P.; Arnell, R. D.; Backer, H.; Bradley, J. W.
Citation:
Surface and coatings technology, 2003, vol. 174/175, pp. 795-800
Publisher:
Elsevier
Publication Date:
Sep-2003
URI:
http://hdl.handle.net/2173/83495
DOI:
10.1016/S0257-8972(03)00356-6
Additional Links:
http://www.elsevier.com/locate/surfcoat
Abstract:
In the field of magnetron sputtering, it is well established that mid-frequency (20–350 kHz) pulsed processing offers many advantages over continuous DC processing for the reactive deposition of dielectric films. By periodically reversing the target voltage, arc events at the target are suppressed and the reactive sputtering process is stabilised. However, recent studies have shown that pulsing the discharge also significantly modifies the characteristics of the magnetron plasma. Specifically, increased plasma density and electron temperatures, and therefore increased ion energy fluxes to the growing film, have been measured. Clearly, this will have an impact on the properties of both insulating and conductive films. In this study, therefore, titanium dioxide and titanium nitride coatings were deposited by pulsed (asymmetric bipolar, 20-kHz pulse frequency) and continuous DC reactive sputtering. The coatings were characterised in terms of their structures and properties using a range of analytical and measurement techniques, including scanning electron microscopy, electron probe microanalysis, X-ray diffraction, micro-hardness testing, scratch adhesion testing, wear testing and surface profilometry. The optical properties of the TiO2 films were also investigated. In this case, the pulsed films showed increased refractive index and peak transmission values in comparison to the DC films, while the tribological properties of both coating types were superior when pulsed processing was used in comparison with continuous processing.
Type:
Article
Language:
en
Description:
Full-text of this article is not available in this e-prints service. This article was originally published [following peer-review] in Surface and Coatings Technology, published by and copyright Elsevier.
Keywords:
Titanium-based films; DC magnetron sputtering; Film properties
ISSN:
0257-8972

Full metadata record

DC FieldValue Language
dc.contributor.authorKelly, Peteren
dc.contributor.authorBeevers, C. F.en
dc.contributor.authorHenderson, P.en
dc.contributor.authorArnell, R. D.en
dc.contributor.authorBacker, H.en
dc.contributor.authorBradley, J. W.en
dc.date.accessioned2009-10-05T11:09:07Z-
dc.date.available2009-10-05T11:09:07Z-
dc.date.issued2003-09-
dc.identifier.citationSurface and coatings technology, 2003, vol. 174/175, pp. 795-800en
dc.identifier.issn0257-8972-
dc.identifier.doi10.1016/S0257-8972(03)00356-6-
dc.identifier.urihttp://hdl.handle.net/2173/83495-
dc.descriptionFull-text of this article is not available in this e-prints service. This article was originally published [following peer-review] in Surface and Coatings Technology, published by and copyright Elsevier.en
dc.description.abstractIn the field of magnetron sputtering, it is well established that mid-frequency (20–350 kHz) pulsed processing offers many advantages over continuous DC processing for the reactive deposition of dielectric films. By periodically reversing the target voltage, arc events at the target are suppressed and the reactive sputtering process is stabilised. However, recent studies have shown that pulsing the discharge also significantly modifies the characteristics of the magnetron plasma. Specifically, increased plasma density and electron temperatures, and therefore increased ion energy fluxes to the growing film, have been measured. Clearly, this will have an impact on the properties of both insulating and conductive films. In this study, therefore, titanium dioxide and titanium nitride coatings were deposited by pulsed (asymmetric bipolar, 20-kHz pulse frequency) and continuous DC reactive sputtering. The coatings were characterised in terms of their structures and properties using a range of analytical and measurement techniques, including scanning electron microscopy, electron probe microanalysis, X-ray diffraction, micro-hardness testing, scratch adhesion testing, wear testing and surface profilometry. The optical properties of the TiO2 films were also investigated. In this case, the pulsed films showed increased refractive index and peak transmission values in comparison to the DC films, while the tribological properties of both coating types were superior when pulsed processing was used in comparison with continuous processing.en
dc.language.isoenen
dc.publisherElsevieren
dc.relation.urlhttp://www.elsevier.com/locate/surfcoaten
dc.subjectTitanium-based filmsen
dc.subjectDC magnetron sputteringen
dc.subjectFilm propertiesen
dc.titleA comparison of titanium-based films produced by pulsed and continuous DC magnetron sputteringen
dc.typeArticleen
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